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Lauri Aarik

https://etis.ee/CV/Lauri_Aarik/eng
22.11.1980
737 4673
lauri.aarik@ut.ee
http://
A-7771-2019

Career

Institutions and positions
01.01.2016–...   
University of Tartu, Faculty of Science and Technology, Institute of Physics, Engineer (1,00)
15.08.2015–31.12.2015   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,80)
01.01.2013–14.08.2015   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,25)
01.07.2012–31.12.2012   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,40)
01.05.2012–30.06.2012   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,50)
01.03.2012–30.04.2012   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,90)
01.07.2011–29.02.2012   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (1,00)
01.02.2010–30.06.2011   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,10)
01.01.2010–31.12.2011   
Estonian Nanotechnology Competence Center, project manager
01.01.2009–31.01.2010   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,50)
01.01.2008–08.02.2008   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,10)
01.04.2007–31.12.2007   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Engineer (0,10)
 
 
Education
2012–05.12.2017   
Materjaliteaduse doktorant

Qualifications

Academic degrees
Lauri Aarik, Doctor's Degree, 2017, (sup) Väino Sammelselg, Atomic layer deposition and characterization of thin oxide films for application in protective coatings, University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Department of Material Science.
 
 
Fields of research
ETIS CLASSIFICATION: 4. Natural Sciences and Engineering; 4.12. Process Technology and Materials Science; CERCS CLASSIFICATION: T150 Material technology
 
 

Projects in progress

Completed projects

Dissertations under supervision

Publications

1.1. Scholarly articles indexed by Web of Science Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index, Emerging Sources Citation Index and/or indexed by Scopus (excluding chapters in books)
 
Aarik, Lauri; Arroval, Tõnis; Mändar, Hugo; Rammula, Raul; Aarik, Jaan (2020). Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes. Applied Surface Science, 530, 147229. DOI: 10.1016/j.apsusc.2020.147229.
 
Lauri Aarik, Jekaterina, Kozlova; Hugo, Mändar; Jaan, Aarik; Väino,Sammelselg (2019). Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel. Materials Chemistry and Physics, 228, 285−292. DOI: 10.1016/j.matchemphys.2019.02.053.
 
Möls, Kristel; Aarik, Lauri; Mändar, Hugo; Kasikov, Aarne; Niilisk, Aahti; Rammula, Raul; Aarik, Jaan (2019). Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films. Optical Materials, 96 (109335), 1−9. DOI: 10.1016/j.optmat.2019.109335.
 
Mondal, Jayanta; Marques, Andreia; Aarik, Lauri; Kozlova, Jekaterina; Simões, Alda; Sammelselg, Väino (2016). Development of thin ceramic-graphene nanolaminated coating for corrosion protection of stainless steel. Corrosion Science, 105, 161−169. DOI: 10.1016/j.corsci.2016.01.013.
 
Arroval, Tonis; Aarik, Lauri; Rammula, Raul; Kruusla, Vegard; Aarik, Jaan (2016). Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum-titanium oxide films. Thin Solid Films, 600, 119−125.10.1016/j.tsf.2016.01.024.
 
Tamm, A.; Kozlova, J.; Arroval, T.; Aarik, L.; Ritslaid, P.; Garcıa, H.; Castan, H.; Duenas, S.; Kukli, K.; Aarik, J. (2015). Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films. Chemical Vapor Deposition, 21, 181−187.10.1002/cvde.201507170.
 
J. Mondal, L. Aarik, J. Kozlova, A. Niilisk, H. Mändar, U. Mäeorg, A. Simões, V. Sammelselg (2015). Functionalization of Titanium Alloy Surface by Graphene Nanoplatelets and Metal Oxides: Corrosion Inhibition. Journal of Nanoscience and Nanotechnology, 15 (9), 6533−6540. DOI: 10.1166/jnn.2015.10775.
 
Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aarik, Jaan; Kukli, Kaupo; Link, Joosep; Stern, Raivo. (2015). Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films grown by atomic layer deposition. Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films, 33 (1), 01A127.10.1116/1.4902079.
 
Möldre, Kristel; Aarik, Lauri; Mändar, Hugo; Niilisk, Ahti; Rammula, Raul; Tarre, Aivar; Aarik, Jaan. (2015). Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure. Journal of Crystal Growth, 428, 86−92.10.1016/j.jcrysgro.2015.07.029.
 
Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Aarik, Jaan (2015). Growth of TixAl1−xOy films by atomic layer deposition using successive supply of metal precursors. Thin Solid Films, 591 (B), 276−284.10.1016/j.tsf.2015.03.014.
 
Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aidla, Aleks; Lu, Jun; Kiisler, Alma-Asta; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Hultman, Lars; Sammelselg, Väino; Kukli, Kaupo; Aarik, Jaan (2014). Atomic layer deposition of ZrO2 for graphene-based multilayer structures: In situ and ex situ characterization of growth process. physica status solidi (a), 211 (2), 397−402. DOI: 10.1002/pssa.201330106.
 
Jaaniso, Raivo; Kahro, Tauno; Kozlova, Jekaterina; Aarik, Jaan; Aarik, Lauri; Alles, Harry; Floren, Aare; Gerst, Alar; Kasikov, Aarne; Niilisk, Ahti; Sammelselg, Väino (2014). Temperature induced inversion of oxygen response in CVD graphene on SiO2. Sensors and Actuators B-Chemical, 190, 1006−1013. DOI: 10.1016/j.snb.2013.09.068.
 
Aarik, Lauri; Arroval, Tõnis; Rammula, Raul; Mändar, Hugo; Sammelselg, Väino; Hudec, Boris; Hušeková, Kristína; Fröhlich, Karol; Aarik, Jaan (2014). Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors. Thin Solid Films, 565, 19−24. DOI: 10.1016/j.tsf.2014.06.038.
 
Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinistö, Jaakko; Mändar, Hugo; Tamm, Aile; Rammula, Raul; Sammelselg, Väino; Aarik, Jaan (2014). Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O. Thin Solid Films, 565, 37−44. DOI: 10.1016/j.tsf.2014.06.052.
 
Arroval, T.; Aarik, L.; Rammula, R.; Mändar, H.; Aarik, J.; Hudec, B.; Hušekova, K.; Fröhlich, K. (2014). Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes. physica status solidi (a), 211 (2), 425−432.10.1002/pssa.201330086.
 
Sammelselg, V.; Netšipailo, I.; Aidla, A.; Tarre, A.; Aarik, L.; Asari, J.; Ritslaid, P.; Aarik, J. (2013). Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition. Thin Solid Films, 542, 219−224. DOI: 10.1016/j.tsf.2013.06.079.
 
Aarik, Lauri; Arroval, Tõnis; Rammula, Raul; Mändar, Hugo; Sammelselg, Väino; Aarik, Jaan (2013). Atomic layer deposition of TiO2 from TiCl4 and O3. Thin Solid Films, 542, 100−107. DOI: 10.1016/j.tsf.2013.06.074.
 
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Mändar, Hugo; Aidla, Aleks; Rammula, Raul; Aarik, Lauri; Roosalu, Kaspar; Lu, Jun; Hultman, Lars; Koel, Mihkel; Kukli, Kaupo; Aarik, Jaan (2013). Atomic layer deposition of high-k dielectrics on carbon nanoparticles. Thin Solid Films, 538, 16−20.10.1016/j.tsf.2012.09.071.
 
Aarik, Jaan; Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Kasikov, Aarne; Mändar, Hugo; Hudec, Boris; Hus'ekova, Kristina; Fröhlich, Karol (2013). Atomic layer deposition of rutile phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current. Journal of Crystal Growth, 382, 61−66. DOI: 10.1016/j.jcrysgro.2013.08.006.
1.2. Peer-reviewed articles in other international research journals with an ISSN code and international editorial board, which are circulated internationally and open to international contributions
 
Lind, L.; Adoberg, E.; Aarik, L.; Kulu, P.; Veinthal, R.; Aal, A. A. (2012). Tribological properties of PVD coatings with lubricating films. Estonian Journal of Engineering, 18 (3), 193−201.
2.3. Dissertations published in a series of dissertations (excluding manuscripts)
 
Aarik, Lauri (2017). Atomic layer deposition and characterization of thin oxide films for application in protective coatings. (Doktoritöö, Tartu Ülikool). Tartu: University of Tartu Press.
3.1. Articles/chapters in books published by the publishers listed in Annex (including collections indexed by the Web of Science Book Citation Index, Web of Science Conference Proceedings Citation Index, Scopus)
 
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Aarik, Lauri; Roosalu, Kaspar; Kärkkänen, Irina; Mändar, Hugo; Aarik, Jaan; Kukli, Kaupo (2013). Atomic Layer Deposition of Zirconium Oxide on Carbon Nanoparticles. IOP Conference Series: Materials Science and Engineering, 49, 012019.10.1088/1757-899X/49/1/012019.
 
Rammula, Raul; Aarik, Lauri; Kasikov, Arne; Kozlova, Jekaterina; Kahro, Tauno; Matisen, Leonard; Niilisk, Ahti; Alles, Harry; Aarik, Jaan (2013). Atomic layer deposition of aluminum oxide films on graphene. IOP Conference Series: Materials Science and Engineering, 49, 012014.10.1088/1757-899X/49/1/012014.
 
Fröhlich, Karol; Hudec, Boris; Tapajna, Milan; Hušekova, Kristina; Rosova, Alica; Eliaš, Peter; Aarik, Jaan; Rammula, Raul; Kasikov, Aarne; Arroval, Tõnis; Aarik, Lauri; Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J. (2013). TiO2-based Metal-Insulator-Metal Structures for Future DRAM Storage Capacities. ECS Transactions, 50 (13), 79−87.10.1149/05013.0079ecst.
5.2. Conference abstracts that do not belong to section 5.1
 
Kasikov, aarne; Aarik, Lauri (2020).

Calculating the absorption edge of thin films

. In: Robert Brunner (Ed.). Proceedings of 11th solid state surfaces and interfaces (Extended Abstract Book). November 23-26, 2020. Slovak Republic (43−46). 11th "Solid State Surfaces and Interfaces", Smolenice, Slovakkia, 23.-26. november 2020. Bratislava: Comeniuse Ülikool, Bratislava, Slovaki Vabariik.
 
Mändar, Hugo; Aarik, Lauri; Tarre, Aivar; Aarik, Jaan (2015).

Structure characterization of lattice-matched rutile and TiO2-II phases grown by atomic layer deposition on α-Al2O3(0 0 1)

. Book of Abstracts 2015: 29th European Crystallographic Meeting; Rovinj, Croatia; August 23-28, 2015. International Union of Crystallography, s518.
 
Möldre, K.; Mändar, H.; Aarik, L.; Tarre, A.; Aarik, J. (2015). Structure characterization of lattice-matched rutile and TiO2-II phases grown by atomic layer deposition on α-Al2O3 (0 0 0 1). In: Acta Crystallographica (S520).29th European Crystallographic Meeting 2015, Rovinj, Croatia, 23-28.08.2015..
 
Aarik, Lauri; Tarre, Aivar; Mändar, Hugo; Puust, Laurits; Kiisk, Valter; Sildos, Ilmo; Aarik, Jaan (2015).

Optical properties of TiO2-II grown by atomic layer deposition

. Program and Abstracts 2015: 13th International Baltic Conference on Atomic Layer Deposition; Tartu, Estonia; 28-29 september, 2015. University of Tartu, Tartu: Tartu Ülikool, P25.
 
Roosalu, Kaspar; Aarik, Lauri; Rammula, Raul; Aarik, Jaan; Kalutarage, Lakmal, C; Winter, Charles, H; Mändar, Hugo (2014). Atomic layer deposition of epitaxial Cr2O3 using bis(1,5-di-tert-butyl-1,2,5-triazapentadienyl)chromium(II) as chromium source. Baltic ALD 2014, 12-13 mai, 2014 Helsinki, Soome.
 
Möldre, Kristel; Aarik, Lauri; Tarre, Aivar; Mändar, Hugo; Aarik, Jaan (2014).
Atomic Layer Deposition of TiO2 on Sapphire: Effect of Substrate Orientation on Structure and Growth Rate of Thin Films
. Book of Abstracts Baltic ALD 2014: 12th International Baltic Conference on Atomic Layer Depostion; Helsinki, Finland; May 12-13, 2014. Ed. Leskelä, Markku; Ritala, Mikko; Härkönen, Emma. Univesity of Helsinki, Finland, 147.
 
Tamm, A.; Kahro, T.; Kozlova, J.; Aarik, L.; Kasikov, A.; Mändar, H.; Rammula, R.; Niilisk, A.; Möldre, K.; Tarre, A.; Alles, H.; Kukli, K.; Aarik, J. (2013). Aatomkihtsadestud dielektikute uurimine grafeeni sisaldavas struktuuris. EMRS-2013, SPRING 13 symposium N: Atomic-scale engineering of multifunctional nano-sized materials and films: EMRS-2013, Strasbourg, Prantsusmaa, mai 2013. x, x.
 
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Aidla, Aleks; Rammula, Raul; Aarik, Lauri; Lu, Jun; Hultman, Lars; Mändar, Hugo; Marandi, Margus; Kukli, Kaupo; Aarik, Jaan (2012). Atomic layer deposition of high-k dielectrics on carbon nanoparticles for potential applications in nonvolatile memories. EMRS 2012 Spring Meeting, Carbon- or Nitrogen-Containing Nanostructured Thin Films: EMRS 2012 Spring Meeting, Strasbourg, France, 14-18. May 2012.

Industrial property

21.01.2021

Lauri Aarik

https://etis.ee/CV/Lauri_Aarik/est
22.11.1980
737 4673
lauri.aarik@ut.ee
A-7771-2019

Teenistuskäik

Töökohad ja ametid
01.01.2016–...   
Tartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut, insener (1,00)
15.08.2015–31.12.2015   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,80)
01.01.2013–14.08.2015   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,25)
01.07.2012–31.12.2012   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,40)
01.05.2012–30.06.2012   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,50)
01.03.2012–30.04.2012   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,90)
01.07.2011–29.02.2012   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (1,00)
01.02.2010–30.06.2011   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,10)
01.01.2010–31.12.2011   
Eesti Nanotehnoloogiate Arenduskeskuse AS, projektijuht
01.01.2009–31.01.2010   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,50)
01.01.2008–08.02.2008   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,10)
01.04.2007–31.12.2007   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, insener (0,10)
 
 
Haridustee
2012–05.12.2017   
Materjaliteaduse doktorant

Kvalifikatsioon

Teaduskraadid
Lauri Aarik, Doctor's Degree, 2017, (sup) Väino Sammelselg, Atomic layer deposition and characterization of thin oxide films for application in protective coatings, University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Department of Material Science.
 
 
Teadustöö põhisuunad
ETIS KLASSIFIKAATOR: 4. Loodusteadused ja tehnika; 4.12. Protsessitehnoloogia ja materjaliteadus; CERCS KLASSIFIKAATOR: T150 Materjalitehnoloogia

Jooksvad projektid

Lõppenud projektid

Juhendamisel väitekirjad

Publikatsioonid

1.1. Scholarly articles indexed by Web of Science Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index, Emerging Sources Citation Index and/or indexed by Scopus (excluding chapters in books)
 
Aarik, Lauri; Arroval, Tõnis; Mändar, Hugo; Rammula, Raul; Aarik, Jaan (2020). Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes. Applied Surface Science, 530, 147229. DOI: 10.1016/j.apsusc.2020.147229.
 
Lauri Aarik, Jekaterina, Kozlova; Hugo, Mändar; Jaan, Aarik; Väino,Sammelselg (2019). Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel. Materials Chemistry and Physics, 228, 285−292. DOI: 10.1016/j.matchemphys.2019.02.053.
 
Möls, Kristel; Aarik, Lauri; Mändar, Hugo; Kasikov, Aarne; Niilisk, Aahti; Rammula, Raul; Aarik, Jaan (2019). Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films. Optical Materials, 96 (109335), 1−9. DOI: 10.1016/j.optmat.2019.109335.
 
Mondal, Jayanta; Marques, Andreia; Aarik, Lauri; Kozlova, Jekaterina; Simões, Alda; Sammelselg, Väino (2016). Development of thin ceramic-graphene nanolaminated coating for corrosion protection of stainless steel. Corrosion Science, 105, 161−169. DOI: 10.1016/j.corsci.2016.01.013.
 
Arroval, Tonis; Aarik, Lauri; Rammula, Raul; Kruusla, Vegard; Aarik, Jaan (2016). Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum-titanium oxide films. Thin Solid Films, 600, 119−125.10.1016/j.tsf.2016.01.024.
 
Tamm, A.; Kozlova, J.; Arroval, T.; Aarik, L.; Ritslaid, P.; Garcıa, H.; Castan, H.; Duenas, S.; Kukli, K.; Aarik, J. (2015). Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films. Chemical Vapor Deposition, 21, 181−187.10.1002/cvde.201507170.
 
J. Mondal, L. Aarik, J. Kozlova, A. Niilisk, H. Mändar, U. Mäeorg, A. Simões, V. Sammelselg (2015). Functionalization of Titanium Alloy Surface by Graphene Nanoplatelets and Metal Oxides: Corrosion Inhibition. Journal of Nanoscience and Nanotechnology, 15 (9), 6533−6540. DOI: 10.1166/jnn.2015.10775.
 
Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aarik, Jaan; Kukli, Kaupo; Link, Joosep; Stern, Raivo. (2015). Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films grown by atomic layer deposition. Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films, 33 (1), 01A127.10.1116/1.4902079.
 
Möldre, Kristel; Aarik, Lauri; Mändar, Hugo; Niilisk, Ahti; Rammula, Raul; Tarre, Aivar; Aarik, Jaan. (2015). Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure. Journal of Crystal Growth, 428, 86−92.10.1016/j.jcrysgro.2015.07.029.
 
Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Aarik, Jaan (2015). Growth of TixAl1−xOy films by atomic layer deposition using successive supply of metal precursors. Thin Solid Films, 591 (B), 276−284.10.1016/j.tsf.2015.03.014.
 
Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aidla, Aleks; Lu, Jun; Kiisler, Alma-Asta; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Hultman, Lars; Sammelselg, Väino; Kukli, Kaupo; Aarik, Jaan (2014). Atomic layer deposition of ZrO2 for graphene-based multilayer structures: In situ and ex situ characterization of growth process. physica status solidi (a), 211 (2), 397−402. DOI: 10.1002/pssa.201330106.
 
Jaaniso, Raivo; Kahro, Tauno; Kozlova, Jekaterina; Aarik, Jaan; Aarik, Lauri; Alles, Harry; Floren, Aare; Gerst, Alar; Kasikov, Aarne; Niilisk, Ahti; Sammelselg, Väino (2014). Temperature induced inversion of oxygen response in CVD graphene on SiO2. Sensors and Actuators B-Chemical, 190, 1006−1013. DOI: 10.1016/j.snb.2013.09.068.
 
Aarik, Lauri; Arroval, Tõnis; Rammula, Raul; Mändar, Hugo; Sammelselg, Väino; Hudec, Boris; Hušeková, Kristína; Fröhlich, Karol; Aarik, Jaan (2014). Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors. Thin Solid Films, 565, 19−24. DOI: 10.1016/j.tsf.2014.06.038.
 
Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinistö, Jaakko; Mändar, Hugo; Tamm, Aile; Rammula, Raul; Sammelselg, Väino; Aarik, Jaan (2014). Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O. Thin Solid Films, 565, 37−44. DOI: 10.1016/j.tsf.2014.06.052.
 
Arroval, T.; Aarik, L.; Rammula, R.; Mändar, H.; Aarik, J.; Hudec, B.; Hušekova, K.; Fröhlich, K. (2014). Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes. physica status solidi (a), 211 (2), 425−432.10.1002/pssa.201330086.
 
Sammelselg, V.; Netšipailo, I.; Aidla, A.; Tarre, A.; Aarik, L.; Asari, J.; Ritslaid, P.; Aarik, J. (2013). Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition. Thin Solid Films, 542, 219−224. DOI: 10.1016/j.tsf.2013.06.079.
 
Aarik, Lauri; Arroval, Tõnis; Rammula, Raul; Mändar, Hugo; Sammelselg, Väino; Aarik, Jaan (2013). Atomic layer deposition of TiO2 from TiCl4 and O3. Thin Solid Films, 542, 100−107. DOI: 10.1016/j.tsf.2013.06.074.
 
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Mändar, Hugo; Aidla, Aleks; Rammula, Raul; Aarik, Lauri; Roosalu, Kaspar; Lu, Jun; Hultman, Lars; Koel, Mihkel; Kukli, Kaupo; Aarik, Jaan (2013). Atomic layer deposition of high-k dielectrics on carbon nanoparticles. Thin Solid Films, 538, 16−20.10.1016/j.tsf.2012.09.071.
 
Aarik, Jaan; Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Kasikov, Aarne; Mändar, Hugo; Hudec, Boris; Hus'ekova, Kristina; Fröhlich, Karol (2013). Atomic layer deposition of rutile phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current. Journal of Crystal Growth, 382, 61−66. DOI: 10.1016/j.jcrysgro.2013.08.006.
1.2. Peer-reviewed articles in other international research journals with an ISSN code and international editorial board, which are circulated internationally and open to international contributions
 
Lind, L.; Adoberg, E.; Aarik, L.; Kulu, P.; Veinthal, R.; Aal, A. A. (2012). Tribological properties of PVD coatings with lubricating films. Estonian Journal of Engineering, 18 (3), 193−201.
2.3. Dissertations published in a series of dissertations (excluding manuscripts)
 
Aarik, Lauri (2017). Atomic layer deposition and characterization of thin oxide films for application in protective coatings. (Doktoritöö, Tartu Ülikool). Tartu: University of Tartu Press.
3.1. Articles/chapters in books published by the publishers listed in Annex (including collections indexed by the Web of Science Book Citation Index, Web of Science Conference Proceedings Citation Index, Scopus)
 
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Aarik, Lauri; Roosalu, Kaspar; Kärkkänen, Irina; Mändar, Hugo; Aarik, Jaan; Kukli, Kaupo (2013). Atomic Layer Deposition of Zirconium Oxide on Carbon Nanoparticles. IOP Conference Series: Materials Science and Engineering, 49, 012019.10.1088/1757-899X/49/1/012019.
 
Rammula, Raul; Aarik, Lauri; Kasikov, Arne; Kozlova, Jekaterina; Kahro, Tauno; Matisen, Leonard; Niilisk, Ahti; Alles, Harry; Aarik, Jaan (2013). Atomic layer deposition of aluminum oxide films on graphene. IOP Conference Series: Materials Science and Engineering, 49, 012014.10.1088/1757-899X/49/1/012014.
 
Fröhlich, Karol; Hudec, Boris; Tapajna, Milan; Hušekova, Kristina; Rosova, Alica; Eliaš, Peter; Aarik, Jaan; Rammula, Raul; Kasikov, Aarne; Arroval, Tõnis; Aarik, Lauri; Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J. (2013). TiO2-based Metal-Insulator-Metal Structures for Future DRAM Storage Capacities. ECS Transactions, 50 (13), 79−87.10.1149/05013.0079ecst.
5.2. Conference abstracts that do not belong to section 5.1
 
Kasikov, aarne; Aarik, Lauri (2020).

Calculating the absorption edge of thin films

. In: Robert Brunner (Ed.). Proceedings of 11th solid state surfaces and interfaces (Extended Abstract Book). November 23-26, 2020. Slovak Republic (43−46). 11th "Solid State Surfaces and Interfaces", Smolenice, Slovakkia, 23.-26. november 2020. Bratislava: Comeniuse Ülikool, Bratislava, Slovaki Vabariik.
 
Mändar, Hugo; Aarik, Lauri; Tarre, Aivar; Aarik, Jaan (2015).

Structure characterization of lattice-matched rutile and TiO2-II phases grown by atomic layer deposition on α-Al2O3(0 0 1)

. Book of Abstracts 2015: 29th European Crystallographic Meeting; Rovinj, Croatia; August 23-28, 2015. International Union of Crystallography, s518.
 
Möldre, K.; Mändar, H.; Aarik, L.; Tarre, A.; Aarik, J. (2015). Structure characterization of lattice-matched rutile and TiO2-II phases grown by atomic layer deposition on α-Al2O3 (0 0 0 1). In: Acta Crystallographica (S520).29th European Crystallographic Meeting 2015, Rovinj, Croatia, 23-28.08.2015..
 
Aarik, Lauri; Tarre, Aivar; Mändar, Hugo; Puust, Laurits; Kiisk, Valter; Sildos, Ilmo; Aarik, Jaan (2015).

Optical properties of TiO2-II grown by atomic layer deposition

. Program and Abstracts 2015: 13th International Baltic Conference on Atomic Layer Deposition; Tartu, Estonia; 28-29 september, 2015. University of Tartu, Tartu: Tartu Ülikool, P25.
 
Roosalu, Kaspar; Aarik, Lauri; Rammula, Raul; Aarik, Jaan; Kalutarage, Lakmal, C; Winter, Charles, H; Mändar, Hugo (2014). Atomic layer deposition of epitaxial Cr2O3 using bis(1,5-di-tert-butyl-1,2,5-triazapentadienyl)chromium(II) as chromium source. Baltic ALD 2014, 12-13 mai, 2014 Helsinki, Soome.
 
Möldre, Kristel; Aarik, Lauri; Tarre, Aivar; Mändar, Hugo; Aarik, Jaan (2014).
Atomic Layer Deposition of TiO2 on Sapphire: Effect of Substrate Orientation on Structure and Growth Rate of Thin Films
. Book of Abstracts Baltic ALD 2014: 12th International Baltic Conference on Atomic Layer Depostion; Helsinki, Finland; May 12-13, 2014. Ed. Leskelä, Markku; Ritala, Mikko; Härkönen, Emma. Univesity of Helsinki, Finland, 147.
 
Tamm, A.; Kahro, T.; Kozlova, J.; Aarik, L.; Kasikov, A.; Mändar, H.; Rammula, R.; Niilisk, A.; Möldre, K.; Tarre, A.; Alles, H.; Kukli, K.; Aarik, J. (2013). Aatomkihtsadestud dielektikute uurimine grafeeni sisaldavas struktuuris. EMRS-2013, SPRING 13 symposium N: Atomic-scale engineering of multifunctional nano-sized materials and films: EMRS-2013, Strasbourg, Prantsusmaa, mai 2013. x, x.
 
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Aidla, Aleks; Rammula, Raul; Aarik, Lauri; Lu, Jun; Hultman, Lars; Mändar, Hugo; Marandi, Margus; Kukli, Kaupo; Aarik, Jaan (2012). Atomic layer deposition of high-k dielectrics on carbon nanoparticles for potential applications in nonvolatile memories. EMRS 2012 Spring Meeting, Carbon- or Nitrogen-Containing Nanostructured Thin Films: EMRS 2012 Spring Meeting, Strasbourg, France, 14-18. May 2012.

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ProgramTypeNumberNameProject startProject endPrincipal investigatorInstitutionFinancing
ETFETF8666Atomically designed protective coatings01.01.201131.12.2012Väino SammelselgUniversity of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu22 080,00 EUR
MTTMTT1Manufacturing, processing and characterization of graphene-based nanostructures01.03.200928.02.2014Harry AllesUniversity of Tartu; University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu479 337,36 EUR
IUTIUT2-24Thin-film structures for nanoelectronic applications and functional coatings01.01.201331.12.2018Väino SammelselgUniversity of Tartu, Faculty of Science and Technology, Institute of Physics2 688 000,00 EUR
MUUSLOFY12164T (3.2.1101.12-0026)Thin nanomaterial coating for functionalising and protection of metal surfaces01.07.201231.12.2014Väino SammelselgUniversity of Tartu406 915,50 EUR
SFSF0180043s08Generation of nanometer particles and formation of aerosol particle size distribution in weakly ionized atmospheric environment01.01.200831.12.2013Urmas HõrrakUniversity of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu579 545,81 EUR
PSGPSG448Formation and stabilization of high-density hard phases of optical materials in thin-film structures01.01.202031.12.2023Lauri AarikUniversity of Tartu, Faculty of Science and Technology, Institute of Physics209 000,00 EUR
2.1.1.LLTFY19326Prolonging the lifetime of Hemo1023.04.201922.04.2020Lauri AarikUniversity of Tartu, Faculty of Science and Technology, Institute of Physics4 075,00 EUR
MUUVLOFY15110Reactor for Linde15.06.201515.10.2015Lauri AarikUniversity of Tartu; University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu9 625,00 EUR
MUUMLOFY10124RRODIN - Suspended graphene nanostructures01.10.201030.09.2013Harry AllesUniversity of Tartu; University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu185 168,02 EUR
TKSLTKT16141T (TK141)Advanced materials and high-technology devices for sustainable energetics, sensorics and nanoelectronics (TK141)01.01.201601.03.2023Enn LustUniversity of Tartu, Faculty of Science and Technology3 293 473,70 EUR
ETFETF6535Development of New Analysis Methods in Environmental Radiation Applications01.01.200531.12.2009Madis KiiskUniversity of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu; University of Tartu, Faculty of Science and Technology (old)30 345,58 EUR