See veebileht kasutab küpsiseid kasutaja sessiooni andmete hoidmiseks. Veebilehe kasutamisega nõustute ETISe kasutustingimustega. Loe rohkem
Olen nõus

Aarne Kasikov

https://etis.ee/CV/Aarne_Kasikov/est
22.04.1957
737 4654,737 4656
aarne.kasikov@ut.ee
PhD

Teenistuskäik

Töökohad ja ametid
01.01.2017–...   
Tartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut, materjaliteaduse teadur (1,00)
01.01.2016–31.12.2016   
Tartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut, materjaliteaduse teadur (1,00)
01.01.2012–31.12.2015   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, materjaliteaduse teadur (1,00)
01.01.2009–31.12.2011   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, materjaliteaduse teadur (1,00)
01.01.2008–31.12.2008   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, erakorraline teadur (1,00)
01.01.2006–31.12.2007   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, erakorraline teadur (1,00)
01.04.2005–31.12.2005   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, sektorijuhataja (1,00)
01.01.2005–31.03.2005   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, sektorijuhataja (0,50)
2002–2004   
Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut, sektorijuhataja (1,00)
01.01.1990–31.12.2005   
Eesti TA FI, sektorijuhataja
01.01.1985–31.12.1990   
ENSV TA FI, nooremteadur
01.01.1983–31.12.1985   
ENSV TA Füüsika Instituut, vaneminsener
01.01.1980–31.12.1983   
12. kaardiväe motolaskurpolk, Gvardejsk, rühmakomandör
01.01.1979–31.12.1980   
ENSV TA FI, insener
 
 
Haridustee
Kõrgem, Tartu Riiklik Ülikool 1979, füüsik, füüsik-pedagoog
 
 
Teadusorganisatsiooniline ja -administratiivne tegevus
Eesti Füüsika Selts, liige
 
 
Loometöö
Füüsika, ajalugu
 
 
Lisainfo
Praktikum ,,Füüsikalised mõõtmised" 2009-

Kvalifikatsioon

Teaduskraadid
Aarne Kasikov, doktorikraad, 2010, (juh) , Optical Characterization of Inhomogeneous Thin Films (Õhukeste mittehomogeensete kilede optiline iseloomustamine), Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut.
Aarne Kasikov, magistrikraad (teaduskraad), 1995, (juh) , Kahekihiline mittehomogeensus aurustatud optilises kihis (MgF2 näitel), Tartu Ülikool, Tartu Ülikooli Füüsika Instituut.
 
 
Teadustöö põhisuunad
ETIS KLASSIFIKAATOR: 4. Loodusteadused ja tehnika; 4.10. Füüsika; TÄPSUSTUS: Vaakumaurustamine, gaasisensorid, õhukeste kilede parameetrite määramine
 
 
Lisainfo
MSc
Tartu Ülikool, 1995

Jooksvad projektid

Lõppenud projektid

Juhendatud väitekirjad

Publikatsioonid

Klass
Aasta
Publikatsioon
 
1.1.
2020
Kahro, Tauno; Castán, Helena; Dueñas, Salvador; Merisalu, Joonas; Kozlova, Jekaterina; Jõgiaas, Taivo; Piirsoo, Helle-Mai; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Tarre, Aivar; Tamm, Aile; Kukli, Kaupo (2020). Structure and behavior of ZrO2-graphene-ZrO2 stacks. Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films, 38 (6), 063411. DOI: 10.1116/6.0000390.
5.2.
2020
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Kukli, Kaupo; Tamm, Aile; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán, Helena (2020). Atomic layer deposition of ZrO2-based thin films. FMTDK Teaduskonverents, Tallinn, 2020. TTÜ, 36−36.
5.2.
2020
Merisalu, Joonas; Arroval, Tõnis; Kasikov, Aarne; Kukli, Kaupo; Tamm, Aile; Aarik, Jaan (2020). Resistive switching in titanium-aluminum-oxide thin films grown by atomic layer deposition. AVS 20th International Conference on Atomic Layer Deposition (ALD 2020). American Vacuum Society,.
5.2.
2020
Kasikov, aarne; Aarik, Lauri (2020).

Calculating the absorption edge of thin films

. In: Robert Brunner (Ed.). Proceedings of 11th solid state surfaces and interfaces (Extended Abstract Book). November 23-26, 2020. Slovak Republic (43−46). 11th "Solid State Surfaces and Interfaces", Smolenice, Slovakkia, 23.-26. november 2020. Bratislava: Comeniuse Ülikool, Bratislava, Slovaki Vabariik.
1.1.
2019
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán, Helena (2019). <p>Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates</p>. Thin Solid Films, 669, 294−300. DOI: 10.1016/j.tsf.2018.11.008.
1.1.
2019
Sarapuu, A.; Hussain, S.; Kasikov, A.; Pollet, B.G.; Tammeveski, K. (2019). Electroreduction of oxygen on Nafion®-coated thin platinum films in acid media. Journal of Electroanalytical Chemistry, 848, 113292.10.1016/j.jelechem.2019.113292.
1.1.
2019
Möls, Kristel; Aarik, Lauri; Mändar, Hugo; Kasikov, Aarne; Niilisk, Aahti; Rammula, Raul; Aarik, Jaan (2019). Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films. Optical Materials, 96 (109335), 1−9. DOI: 10.1016/j.optmat.2019.109335.
1.1.
2019
Kasikov, Aarne; Tarre, Aivar; Marandi, Margus (2019).

Dispersion of chromia films (eskolaite) in UV-VIS

. Journal of Electrical Engineering, 70 (7), 36−43.10.2478/jee-2019-0039.
1.1.
2018
Kasikov, Aarne; Kahro, Tauno; Matisen, Leonard; Kodu, Margus; Tarre, Aivar; Seemen, Helina; Alles, Harry (2018). The optical properties of transferred graphene and the dielectrics grown on it obtained by ellipsometry. Applied Surface Science, 437, 410−417.10.1016/j.apsusc.2017.08.109.
1.1.
2018
Lüsi, Madis; Erikson, Heiki; Merisalu, Maido; Kasikov, Aarne; Matisen, Leonard; Sammelselg, Vaino; Tammeveski, Kaido (2018). Oxygen Electroreduction in Alkaline Solution on Pd Coatings Prepared by Galvanic Exchange of Copper. Electrocatalysis, 9 (3), 400−408. DOI: 10.1007/s12678-017-0445-z.
1.1.
2018
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2018). <p>Atomic layer deposition and properties of ZrO<sub>2</sub>/Fe<sub>2</sub>O<sub>3</sub> thin films</p>. Beilstein Journal of Nanotechnology, 9 (14), 119−128. DOI: 10.3762/bjnano.9.14.
5.2.
2018
Kasikov, Aarne; Tarre, Aivar; Marandi, Margus (2018).

Dispersion of ALD Cr2O3 films in UV-Vis region

. In: Robert Brunner (Ed.). Proceedings of 10th solid state surfaces and interfaces (EXTENDED ABSTRACT BOOK). November 19-22, 2018. Smolenice, Slovak Republic (38−39).10th Solid State Surfaces and Interfaces. Bratislava: Comenius University Bratislava.
3.4.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. IEEE EDS Min-Colloquium, CDE 2017, Advanced Materials and Devices: Challenges and Opportunities: 11th Spanish Conference on Electron Devices, 8-11 February 2017, Barcelona, Spain. IEEE Electron Devices Society, R0030.
5.2.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. FMTDK Teaduskonverents 2017. Tartu Ülikool.
5.2.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Tamm, Aile; Rähn, Mihkel; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. International conference ‘Functional materials and Nanotechnologies-2017’, Tartu, 2017. Tartu Ülikool.
5.2.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Tamm, Aile; Rähn, Mihkel; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. Joint EUROCVD 21 - Baltic ALD 15, Linköping, 2017. Linköping University, 129−129.
1.1.
2016
Kodu, Margus; Berholts, Artjom; Kahro, Tauno; Avarmaa, Tea; Kasikov, Aarne; Niilisk, Ahti; Alles, Harry; Jaaniso, Raivo (2016). Highly sensitive NO2 sensors by pulsed laser deposition on graphene. Applied Physics Letters, 109, 113108. DOI: 10.1063/1.4962959.
5.2.
2016
Kasikov, A.; Kahro, T.; Matisen, L.; Alles, H. (2016).

Transferred CVD graphene on SiO2/Si substrate viewed by ellipsometry

. In: Ro'bert Brunner (Ed.). Proceedings of 9th solid state surfaces and interfaces (EXTENDED ABSTRACT BOOK). November 21-24, 2016 Pies't'any, Slovak Republic (46−48).Solid State Surfaces and Interfaces (SSSI 2016), Pies't'any, Slovakkia, 21.-24. november 2016. Bratislava: Comenius University in Bratislava.
1.1.
2015
Ogorodnikov, I.; Omelkov, S.; Pustovarov, V.; Kasikov, A.; Kirm, M. (2015). Optical and luminescence characterization of LiBaAlF6 single crystals. Optical Materials, 39, 52−57.10.1016/j.optmat.2014.10.063.
5.2.
2015
Tamm, Aile; Oja Acik, Ilona; Kasikov, Aarne; Möldre, Kristel; Arroval, Tõnis; Krunks, Malle; Mere, Arvo; Aarik, Jaan (2015).

Surface plasmon Resonance Caused By Gold Nanoparticles Formed On Atomic Layer Deposited TiO2 Films

. In: Baltic ALD 2015. September 25-29, 2015. International Baltic Conference on Atomic Layer Deposition. Program and Abstracts (P30). Balti ALD. Rahvusvaheline aatomkihtsadestamise Balti konverents. Tartu.
1.1.
2014
Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aidla, Aleks; Lu, Jun; Kiisler, Alma-Asta; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Hultman, Lars; Sammelselg, Väino; Kukli, Kaupo; Aarik, Jaan (2014). Atomic layer deposition of ZrO2 for graphene-based multilayer structures: In situ and ex situ characterization of growth process. physica status solidi (a), 211 (2), 397−402. DOI: 10.1002/pssa.201330106.
1.1.
2014
Jaaniso, Raivo; Kahro, Tauno; Kozlova, Jekaterina; Aarik, Jaan; Aarik, Lauri; Alles, Harry; Floren, Aare; Gerst, Alar; Kasikov, Aarne; Niilisk, Ahti; Sammelselg, Väino (2014). Temperature induced inversion of oxygen response in CVD graphene on SiO2. Sensors and Actuators B-Chemical, 190, 1006−1013. DOI: 10.1016/j.snb.2013.09.068.
1.1.
2014
Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Hus'ekova, Kristina; Dobroc'ka, Edmund; Rammula, Raul, Kasikov, Aarne; Han, Jeong Hwan; Lee, Wongkyu, Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J; Frey, Lothar; Fröhlich, Karol; Aarik, Jaan; Hwang, Cheol Seong (2014). Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes. ACS Applied Materials & Interfaces, 6 (4), 2486−2492.10.1021/am4049139.
1.1.
2013
Aarik, Jaan; Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Kasikov, Aarne; Mändar, Hugo; Hudec, Boris; Hus'ekova, Kristina; Fröhlich, Karol (2013). Atomic layer deposition of rutile phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current. Journal of Crystal Growth, 382, 61−66. DOI: 10.1016/j.jcrysgro.2013.08.006.
1.1.
2013
Hudec, Boris; Hus'ekova, Kristina; Rosova, Alica; S'oltys, Jan; Rammula, Raul; Kasikov, Aarne; Uustare, Teet; Mic'us'ik, Matej; Omastova, Maria; Aarik, Jaan; Fröhlich, Karol (2013). Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor. Journal of Physics D Applied Physics, 46 (38), 385304−8. DOI: 10.1088/0022-3727/46/38/385304.
1.1.
2013
Rosental, Arnold; Tarre, Aivar; Gerst, Alar; Kasikov, Aarne; Lu, Jun; Ottosson, Mikael; Uustare, Teet (2013). Epitaxial single and double nanolayers of SnO2 and TiO2 for resistive gas sensors. IEEE Sensors Journal, 13 (5), 1648−1655.10.1109/JSEN.2013.2238227.
1.1.
2013
Kibena, E.; Marandi, M.; Mäeorg, U.; Venarusso, L.; Maia, G.; Matisen, L.; Kasikov, A.; Sammelselg, V.; Tammeveski, K. (2013). Electrochemical modification of gold electrodes with azobenzene derivatives by diazonium reduction. ChemPhysChem, 14 (5), 1043−1054. DOI: 10.1002/cphc.201200934.
3.1.
2013
Fröhlich, Karol; Hudec, Boris; Tapajna, Milan; Hušekova, Kristina; Rosova, Alica; Eliaš, Peter; Aarik, Jaan; Rammula, Raul; Kasikov, Aarne; Arroval, Tõnis; Aarik, Lauri; Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J. (2013). TiO2-based Metal-Insulator-Metal Structures for Future DRAM Storage Capacities. ECS Transactions, 50 (13), 79−87. DOI: 10.1149/05013.0079ecst.
3.1.
2013
Rammula, Raul; Aarik, Lauri; Kasikov, Arne; Kozlova, Jekaterina; Kahro, Tauno; Matisen, Leonard; Niilisk, Ahti; Alles, Harry; Aarik, Jaan (2013). Atomic layer deposition of aluminum oxide films on graphene. IOP Conference Series: Materials Science and Engineering, 49, 012014. DOI: 10.1088/1757-899X/49/1/012014.
5.2.
2013
Kasikov, A., Tarre, A., Möldre, K., Aarik, J. (2013). Ellipsometric characterization of the growth of ALD TiO2 films. In: Robert Brunner (Ed.). Proceedings of 8th solid state surfaces and interfaces (EXTENDED ABSTRACT BOOK) (74−74).Solid State Surfaces and Interfaces SSSI 2013, 25- 28 november 2013, Smolenice, Slovakkia. Bratislava: Comenius University.
5.2.
2013
Tamm, A.; Kahro, T.; Kozlova, J.; Aarik, L.; Kasikov, A.; Mändar, H.; Rammula, R.; Niilisk, A.; Möldre, K.; Tarre, A.; Alles, H.; Kukli, K.; Aarik, J. (2013). Aatomkihtsadestud dielektikute uurimine grafeeni sisaldavas struktuuris. EMRS-2013, SPRING 13 symposium N: Atomic-scale engineering of multifunctional nano-sized materials and films: EMRS-2013, Strasbourg, Prantsusmaa, mai 2013. x, x.
5.2.
2013
Kahro, Tauno; Kasikov, Aarne; Tarre, Aivar; Gerst, ALar; Niilisk, Ahti; Tõnisoo, Arvo; Möldre, Kristel; Kozlova, Jekaterina; Aarik, Jaan; Alles, Harry; Sammelselg, Väino (2013).

Growing of a thin layer of TiO2 dielectric on CVD graphene

. NT13 International Conference on the Science and Applications of Nanotubes, Programs & Abstracts: NT13, Graphene Satellite Symposium (GSS13), Tallinn, June 29, 2013. Ed. Leila Mäkinen, Toma Susi. Aalto University, School of Science: Aalto University Publication Group, p. 288.
5.2.
2013
Kozlova, Jekaterina; Niilisk, Ahti; Kasikov, Aarne; Gerst, Alar; Kahro, Tauno; Alles, Harry; Sammelselg, Väino (2013).

Quality of graphene prepared by CVD method on nickel

. NT13 Fourteenth International Conference on the Science and Application of Nanotubes, Programs & Abstracts: NT13, 4th Graphene Satellite Symposium (GSS13), Tallinn, Estonia, June 29, 2013. Ed. Leila Mäkinen, Toma Susi. Aalto University, Espoo, Finland: Aalto University Publication Group, p. 290.
1.1.
2012
Aarik, Jaan; Hudec, Boris; Hus'ekova, Kristina; Rammula, Raul; Kasikov, Aarne, Arroval, Tõnis; Uustare, Teet; Fröhlich, Karol (2012). Atomic layer deposition of high-permittivity TiO2 dielectrics with low leakage current on RuO2 in TiCl4-based processes. Semiconductor Science and Technology, 27 (7), 074007−(6). DOI: 10.1088/0268-1242/27/7/074007.
1.3.
2012
Kasikov, Aarne (2012). Mõned statistilised kommentaarid. Mari Järvelaid. "Seksuaalsus ja Homo Sapiens." - Akadeemia, 2012, nr 7, lk 1203-1240, nr 8, lk 1426-1458. Akadeemia, 24 (12), 2279−2281.
5.2.
2012
Kasikov, Aarne; Aarik, Jaan; Mändar, Hugo (2012). Transmission spectrometry vs. spectral ellipsometry: Bruggeman EMA layer revisited. In: R.Brunner (Ed.). Progress in Applied Surface, Interface and Thin Film Science 2012. SURFINT-SREN III. May 14-18, 2012-04-27 Florence, Italy. EXTENDED ABSTRACT BOOK (45−46).Progress in Applied Surface, Interface and Thin Film Science 2012. SURFINT-SREN III. 14.-18.mai 2012, Firenze, Itaalia. Bratislava: Comenius University.
1.1.
2011
Fröhlich, K.; Hudec, B.; Aarik, J.; Tarre, A.; Machajdik, D.; Kasikov, A.; Hus'ekova, K.; Gaz'i, S'. (2011). Post-deposition processing and oxygen content of TiO2-based capacitors. Microelectronic Engineering, 88 (7), 1525−1528.10.1016/j.mee.2011.03.129.
1.1.
2011
Hudec, Boris; Hus'ekova, Kristina; Tarre, Aivar; Jeong, Hwan Han; Sosa, Han; Rosova, Alica; Lee, Woongkyu; Kasikov, Aarne; Seul, Ji Song; Aarik, Jaan; Cheol, Song Hwang; Fröhlich, Karol (2011). Electric properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes. Microelectronic Engineering, 88 (7), 1514−1516.10.1016/j.mee.2011.03.059.
1.1.
2011
Hudec, B.; Hus'ekova, K.; Dobroc'ka, E.; Aarik, J.; Rammula, R.; Kasikov, A.; Tarre, A.; Vincze, A.; Fröhlich, K. (2011). Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile dielectric layer. Journal of Vacuum Science and Technology B, 29 (1), 01AC09-1−01AC09-7.
1.1.
2011
Erikson, H.; Kasikov, A.; Johans, C.; Kontturi, K.; Tammeveski, K.; Sarapuu, A. (2011). Oxygen reduction on Nafion-coated thin-film palladium electrodes. Journal of Electroanalytical Chemistry, 652, 1−7. DOI: 10.1016/j.jelechem.2010.12.021.
1.2.
2011
Савихин, Федор; Касиков, Аарне; Васильченко, Евгений (2011). Эволюция взгляда на заселение русскими западного берега Чудского озера (Эстония) и на формирование беспоповского старообрядчества в Причудье. Антропологический форум Online, 15, 112−162.
3.1.
2011
Fröhlich, K.; Hudec, B.; Hušeková, K.; Aarik, J.; Tarre, A.; Kasikov, A.; Rammula, R.; Vincze, A. (2011). Low Equivalent Oxide Thickness TiO2 Based Capacitors for DRAM Application. In: J. Elam, S. De Gendt, A. Londergan, S. Bent, O. Van der Straten, A. Delabie, F. Roozeboom (Ed.). ECS Transactions (73−77). . The Electrochemical Society Inc.. (2). DOI: 10.1149/1.3633656.
1.1.
2010
Sarapuu, A.; Kasikov, A.; Wong, N.; Lucas, C.A.; Sedghi, G.; Nichols, R.J.; Tammeveski, K. (2010). Electroreduction of oxygen on gold-supported nanostructured palladium films in acid solutions. Electrochimica Acta, 55 (22), 6768−6774.10.1016/j.electacta.2010.05.092.
2.3.
2010
Kasikov, Aarne (2010). Optical characterization of inhomogeneous thin films. (Doktoritöö, Tartu Ülikool). Tartu: Tartu University Press.
3.1.
2010
Hudec, B.; Hušekova, K.; Aarik, J.; Tarre, A.; Kasikov, A.; Fröhlich, K. (2010). RuO2/TiO2 based MIM capacitors for DRAM application. In: The 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM 2010); Smolenice, Slovakia; 25-27 Oct. 2010 (341−344).. Piscataway, NJ, USA: IEEE.10.1109/ASDAM.2010.5666356.
5.2.
2010
Kasikov, A. (2010). Metal nanoparticles at an early stage of nucleation. In: Robert Brunner (Ed.). 7th solid state surfaces and interfaces. Extended abstaract book (18−19).7th Conference "Solid State Surfaces and Interfaces", Smolenice loss, Slovakkia, 22.-25. november 2010. Bratislava: Comenius University.
1.1.
2009
Kasikov, A.; Gerst, A.; Kikas, A.; Matisen, L.; Saar, A.; Tarre, A.; Rosental, A. (2009). Pt coated Cr2O3 thin films for gas sensors. Central European Journal of Physics, 7 (2), 356−362. DOI: 10.2478/s11534-009-0049-1.
1.1.
2009
Feldbach, E.; Jaaniso, R.; Kodu, M.; Denks, Viktor P.; Kasikov, A.; Liblik, P.; Maaroos, A.; Mändar, H.; Kirm, M. (2009). Luminescence characterization of ultrathin MgO films of high crystallinity prepared by pulsed laser deposition. Journal of Materials Science-Materials in Electronics, 20 (1), S321−S325. DOI: 10.1007/s10854-008-9599-z.
1.2.
2009
Савихин, Ф.; Kasikov, A.; Васильченко, Е. (2009). Динамика изменения численности русского населения в Западном Причудье (Эстония) в XVII-XIX веках и проблема старообрядчества. Studia Slavica Hungarica, 54 (2), 429−445. DOI: 10.1556/Sslav.54.2009.2.8.
3.2.
2009
Васильченко, Е.; Савихин, Ф.; Касиков, А. (2009). Эволюция взгляда на заселение русскими западного берега Чудского озера. Valentina Bannikova. Дни культуры Причудья 2008-2009 (90−100).. Tallinn: "Новое издательство".
1.1.
2008
Sarapuu, A.; Kallip, S.; Kasikov, A.; Matisen, L.; Tammeveski, K. (2008). Electroreduction of oxygen on gold-supported thin Pt films in acid solutions. Journal of Electroanalytical Chemistry, 624, 144−150. DOI: 10.1016/j.jelechem.2008.09.001.
1.1.
2008
Sarapuu, A.; Kasikov, A.; Laaksonen, T.; Kontturi, K.; Tammeveski, K. (2008). Electrochemical reduction of oxygen on thin-film Pt electrodes in acid solutions. Electrochimica Acta, 53 (20), 5873−5880. DOI: 10.1016/j.electacta.2008.04.003.
1.1.
2008
Josepson, R.; Laan, M.; Aarik, J.; Kasikov, A. (2008). Photoinduced field-assisted electron emission from dielectric-coated electrodes into gases. Journal of Physics D Applied Physics, 41, 135209. DOI: 10.1088/0022-3727/41/13/135209.
1.1.
2008
Kasikov, A. (2008). Optical inhomogeneity model for evaporatef Y2O3 obtained from physical thickness measurement. Applied Surface Science, 254 (12), 3677−3680. DOI: 10.1016/j.apsusc.2007.10.071.
3.2.
2008
Савихин, Федор; Касиков, Арне (2008). Русские в Причудье. Кто они? Русские вне России. История пути. (13−18).. Таллин: Русский дом.
5.2.
2008
Kasikov, A.; Gerst, A.; Matisen, L.; Saar, A.; Tarre, A.; Rosental, A. (2008). Sensitizing Cr2O3 thin films for resistive gas sensors by Pt coating. 6th solid state surfaces and interfaces. November 24-27, 2008 Smolenice Castle, Slovak Republic. Extended abstract book.: 6th solid state surfaces and interfaces. Smolenice, Slovakkia, 24.-27. november 2008. Ed. Brunner, R. Bratislava: Comenius University, 26−29.
1.1.
2007
Denks, V.; Aints, M.; Avarmaa, T.; Choi, J.-S.; Feldbach, E.; Jaaniso, R.; Kasikov, A.; Kirm, M.; Kodu, M.; Lee, M.-S.; Maaroos, A.; Matulevich, Y.T.; Mändar, H.; Raud, J. (2007). Investigation of possible replacement of protective magensium oxide layer in plasma display panels by barium ternary oxides. Journal of Physics D Applied Physics, 40 (15), 4503−4507. DOI: 10.1088/0022-3727/40/15/020.
3.1.
2007
Aarik, J.; Kasikov, A.; Niilisk, A. (2007). Spectrophotometric and Raman spectroscopic characterization of ALD grown TiO2 thin films. Proceedings of SPIE, Advanced Optical Materials, Technologies, and Devices, 6596: 5th International Conference on Advanced Optical Materials, Technologies, and Devices; Vilnius; 27-30 August 2006. Ed. Ašmontas; S.; Gradauskas, J. Bellingham, WA: SPIE, 659616-1−659616-6. (Proceedings of SPIE). DOI: 10.1117/12.726492.
3.5.
2007
Savihin, F.; Kasikov, A.; Vasilchenko, J. (2007). Русские Причудья Эстонии в XVI-XVIII веках (по историческим и языковым данным). Toim. Т.Г.Иванова и др. Петрозаводск: Электронная библиотека музея-заповедника "КИЖИ",.
5.2.
2007
Aarik, J.; Aidla, A.; Kasikov, A.; Mändar, H.; Uustare, T.; Lu, J. (2007). Atomic layer deposition of crystalline Al2O3 thin films. Book of Abstracts: E-MRS 2007 Fall Meeting; Warsaw, Poland; 17 -21 September 2007. Warsaw: Pielaszek Research, 86−87.
1.1.
2006
Aarik, J.; Aidla, A.; Kasikov, A.; Mändar, H.; Rammula, R.; Sammelselg, V. (2006). Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2and ZrO2 thin films. Applied Surface Science, 252 (16), 5723−5734.
1.1.
2006
Kasikov, A.; Aarik, J.; Mandar, H.; Moppel, M.; Pars, M.; Uustare, T. (2006). Refractive index gradients in TiO2 thin films grown by atomic layer deposition. Journal of Physics D: Applied Physics, 39 (1), 54−60.
5.2.
2006
Kasikov, A. (2006).    . Extended Abstract Book: SSSI5. 5th solid state surfaces and interfaces; Smolenice Castle, Slovak Republic; November 19-24, 2006. Ed. Brunner, R. Bratislava: Institute of Physics, 53.
5.2.
2006
Kasikov, A.; Aarik, J.; Niilisk, A. (2006). Spectrophotometric and Raman Spectroscopic Characterization of ALD Grown TiO2 Thin Films    . Program and Abstracts: AOMD-5. 5th International Conference "Advanced Optical Materials and Devices": Vilnius, Lithuania; 27-30 August, 2006. Vilnius: Semiconductor Physics Institute, Lithuania, 40−40.
1.1.
2005
Савихин, Ф.; Kasikov, A. (2005). Новый взгляд на формирование русского старообрядчества в Западном Причудье Эстонии : (по историческим и языковым данным). Russian Linguistics, 2, 137−187. DOI: 10.1007/s11185-005-2030-y.
1.1.
2005
Savikhin, FA.; Kasikov, A. (2005). A new look at the formation of old believer communities in the western Prichud'e of Estonia (on the basis of historical and linguistic data). Russian Linguistics, 29 (2), 137−187.
3.1.
2005
Tarre, A.; Rosental, A.; Uustare, T.; Kasikov, A. (2005). SnO2 on Sapphire. In: Rosental, A. (Ed.). Optical Materials and Applications (1−10). . SPIE. (Proceedings of SPIE).
3.1.
2005
Aarik, J.; Kasikov, A.; Kirm, M.; Lange, S.; Uustare, T.; Mändar, H. (2005). Optical properties of crystalline Al2O3 thin films grown by atomic layer deposition. Proceedings og the Society of Photo-Optical Instrumentation Engineers (SPIE): 4th International Conference on Advanced Optical Materials and Devices, Tartu, Estonia, Jul 06-09, 2004. Toim. Rosental, A., 1−10.
5.2.
2005
Kasikov, A. (2005).          . Abstract Book: 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures ICTF 13/ACSIN 8; Stockholm; 19-23 June 2005. Stockholm: Congrex Sweden AB/Informationsbolaget Nyberg Co, 69.
5.2.
2003
Sammelselg, V.; Aarik, J.; Mändar, H.; Kikas, A.; Käämbre, T.; Kasikov, A.; Zakharov, A.; Jurss, K.; Tapper, U.; Kauppinen, E.; Niinistö, L. (2003). Problems of Thin Films Characterization: Examples Based on HfO2 Films. 890: Symposia U1, 8th European Congress on Advanced Materials and Processes (EUROMAT 2003); Lausanne, Switzerland; September 1-5, 2003. Lausanne, 890.
5.2.
2002
Jurss, K.; Sammelselg, V.; Kasikov, A.; Tarre, A.; Aarik, J. (2002). AFM Investigations of ZrO2 Thin Films. Abstract Book: The 4th Nordic-Baltic SPM Workshop; Tartu, Estonia; May 29-31, 2002. Ed. I. Kink. Tartu Ülikooli Füüsika Instituut, 33−34.
5.2.
2002
Kasikov, A. (2002). Interference in a Thin Film - What Can We See? Proceedings of 3rd SSSI: Solid State Surfaces and Interfaces III; Smolenice, Slovak Republic; 19-21 November 2002. Ed. Gmucova, K.; Brunner, R. Bratislava: Comenius University Press, 40.
5.2.
2002
Kasikov, Aarne; Mändar, Hugo; Sammelselg, Väino; Aarik, Jaan (2002). Optical Properties of ZrO2 Thin Films Grown in Chloride-based Atomic Layer Deposition Process. In: Eva Majkova, Stefan Luby (Ed.). Book of Abstracts. ICTF12. 12th International Conference on Thin Films (114).12th International Conference on Thin Films. Bratislava, 15.-20. september 2002. Bratislava: Institute of Physics, Slovak Academy of Sciences in VEDA, Publishing House of SAS.
1.1.
2001
Niilisk, A.; Rosental, A.; Uustare, T.; Kasikov, A.; Tarre, A. (2001). Chloride atomic-layer chemical vapor deposition of TiO2 with a chloride pretreatment of substrates. Journal de Physique IV, 11, 103−107.
3.1.
2000
Kasikov, A. (2000). LaF3 as a high-index material in VUV. Proc. SPIE. Optical Organic and Inorganic Materials, 4415: Vilnius, 16.-19. august 2000. Bellingham, USA: Spie - International Society For Optical Engineering, 110−114.
6.3.
2000
Kasikov, A. (2000). Arvustus. Vikerkaar, 5-6, 172.
1.1.
1999
Rosental, A.; Tarre, A.; Adamson, P.; Gerst, A.; Kasikov, A.; Niilisk, A. (1999). Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection. Applied Surface Science, 142, 204−209.
1.1.
1999
Sammelselg, V.; Aarik, J.; Aidla, A.; Kasikov, A.; Heikinheimo, E.; Peussa, M.; Niinisto, L. (1999). Composition and thickness determination of thin oxide films: comparison of different programs and methods. Journal of Analytical Atomic Spectrometry, 14 (3), 523−527.
1.2.
1998
Männik, J.; Aarik, J.; Sildos, I.; Kasikov, A.; Aidla, A. (1998). Spectroscopic study of thin titanium dioxide films grown by atomic layer deposition. Proceedings of the Estonian Academy of Sciences. Physics. Mathematics, 47, 56−62.
5.2.
1998
Sammelselg, V.; Aarik, J.; Aidla, A.; Kasikov, A.; Heikinheimo, E.; Peussa, M.; Niinistö, L. (1998). Composition and thickness determination of thin oxide films: Comparison of different programmes and methods. Book of Abstracts: 15th International Congress on X-ray Optics and Microanalysis; Antverpen, Belgium; 24-27 August, 1998. , 102.
3.2.
1996
Kasikov, A.; Kuznetsov, A. S. (1996). Aging of evaporated MgF(2) descripted by various number of parameters. Proceedings of the SPIE, 2967, 237−241.
1.1.
1994
Kasikov, A.; Kuznetsov, A.S. (1994). Model of inhomogeneity for an evaporated mgf2 layer on quartz. Journal of Physics D: Applied Physics, 27 (12), 2470−2474.
3.2.
1990
Касиков, Х.; Касиков, А. (1990). Еще раз о Рюрике Новгородском и Рорике Датчанине. Скандинавский сборник (98−109). . Таллинн: Olion.
23.11.2020

Aarne Kasikov

https://etis.ee/CV/Aarne_Kasikov/eng
22.04.1957
737 4654,737 4656
aarne.kasikov@ut.ee
Ph.D.

Career

Institutions and positions
01.01.2017–...   
University of Tartu, Faculty of Science and Technology, Institute of Physics, Research Fellow in Material Science (1,00)
01.01.2016–31.12.2016   
University of Tartu, Faculty of Science and Technology, Institute of Physics, Research Fellow (1,00)
01.01.2012–31.12.2015   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Research Fellow (1,00)
01.01.2009–31.12.2011   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Research Fellow in Material Science (1,00)
01.01.2008–31.12.2008   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Research Fellow extraordinarius (1,00)
01.01.2006–31.12.2007   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Research Fellow extraordinarius (1,00)
01.04.2005–31.12.2005   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Head (1,00)
01.01.2005–31.03.2005   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, Head (0,50)
2002–2004   
University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu, sektorijuhataja (1,00)
01.01.1990–31.12.2005   
Section Head, Ac.Sci.Estonia
01.01.1985–31.12.1990   
Junior Researcher, Inst. of Physics, Ac.Sci.ESSR
01.01.1983–31.12.1985   
Institute of Physics, Ac.Sci.ESSR, senior engineer
01.01.1980–31.12.1983   
Platoon Commander, 12. Guard Motorized Rifle Regiment, Gvardejsk
01.01.1979–31.12.1980   
Ingenieur, Ac.Sci.ESSR
 
 
Education
Tartu State University, 1979, physicist
 
 
R&D related managerial and administrative work
Estonian Physical Society, member
 
 
Creative work
Füüsika, ajalugu
 
 
Additional information
Laboratory course "Physical measurements" 2009-

Qualifications

Academic degrees
Aarne Kasikov, Doctor's Degree, 2010, (sup) , Optical Characterization of Inhomogeneous Thin Films, University of Tartu, Faculty of Science and Technology (old), Institute of Physics, University of Tartu.
Aarne Kasikov, Research Master's Degree, 1995, (sup) , Kahekihiline mittehomogeensus aurustatud optilises kihis (MgF2 näitel) (Two-layer inhomogeneity in an evaporated optical layer (MgF2 as an example)), Tartu Ülikool, Tartu Ülikooli Füüsika Instituut.
 
 
Fields of research
ETIS CLASSIFICATION: 4. Natural Sciences and Engineering; 4.10. Physics and Technical Physics; SPECIFICATION: Vacuum evaporation, gas sensors, thin film characterizing
 
 
Additional information
MSc
University of Tartu, 1995

Projects in progress

Completed projects

Supervised dissertations

Publications

Category
Year
Publication
 
1.1.
2020
Kahro, Tauno; Castán, Helena; Dueñas, Salvador; Merisalu, Joonas; Kozlova, Jekaterina; Jõgiaas, Taivo; Piirsoo, Helle-Mai; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Tarre, Aivar; Tamm, Aile; Kukli, Kaupo (2020). Structure and behavior of ZrO2-graphene-ZrO2 stacks. Journal of Vacuum Science & Technology A: Vacuum Surfaces and Films, 38 (6), 063411. DOI: 10.1116/6.0000390.
5.2.
2020
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Kukli, Kaupo; Tamm, Aile; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán, Helena (2020). Atomic layer deposition of ZrO2-based thin films. FMTDK Teaduskonverents, Tallinn, 2020. TTÜ, 36−36.
5.2.
2020
Merisalu, Joonas; Arroval, Tõnis; Kasikov, Aarne; Kukli, Kaupo; Tamm, Aile; Aarik, Jaan (2020). Resistive switching in titanium-aluminum-oxide thin films grown by atomic layer deposition. AVS 20th International Conference on Atomic Layer Deposition (ALD 2020). American Vacuum Society,.
5.2.
2020
Kasikov, aarne; Aarik, Lauri (2020).

Calculating the absorption edge of thin films

. In: Robert Brunner (Ed.). Proceedings of 11th solid state surfaces and interfaces (Extended Abstract Book). November 23-26, 2020. Slovak Republic (43−46). 11th "Solid State Surfaces and Interfaces", Smolenice, Slovakkia, 23.-26. november 2020. Bratislava: Comeniuse Ülikool, Bratislava, Slovaki Vabariik.
1.1.
2019
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Jõgiaas, Taivo; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán, Helena (2019). <p>Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates</p>. Thin Solid Films, 669, 294−300. DOI: 10.1016/j.tsf.2018.11.008.
1.1.
2019
Sarapuu, A.; Hussain, S.; Kasikov, A.; Pollet, B.G.; Tammeveski, K. (2019). Electroreduction of oxygen on Nafion®-coated thin platinum films in acid media. Journal of Electroanalytical Chemistry, 848, 113292.10.1016/j.jelechem.2019.113292.
1.1.
2019
Möls, Kristel; Aarik, Lauri; Mändar, Hugo; Kasikov, Aarne; Niilisk, Aahti; Rammula, Raul; Aarik, Jaan (2019). Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films. Optical Materials, 96 (109335), 1−9. DOI: 10.1016/j.optmat.2019.109335.
1.1.
2019
Kasikov, Aarne; Tarre, Aivar; Marandi, Margus (2019).

Dispersion of chromia films (eskolaite) in UV-VIS

. Journal of Electrical Engineering, 70 (7), 36−43.10.2478/jee-2019-0039.
1.1.
2018
Kasikov, Aarne; Kahro, Tauno; Matisen, Leonard; Kodu, Margus; Tarre, Aivar; Seemen, Helina; Alles, Harry (2018). The optical properties of transferred graphene and the dielectrics grown on it obtained by ellipsometry. Applied Surface Science, 437, 410−417.10.1016/j.apsusc.2017.08.109.
1.1.
2018
Lüsi, Madis; Erikson, Heiki; Merisalu, Maido; Kasikov, Aarne; Matisen, Leonard; Sammelselg, Vaino; Tammeveski, Kaido (2018). Oxygen Electroreduction in Alkaline Solution on Pd Coatings Prepared by Galvanic Exchange of Copper. Electrocatalysis, 9 (3), 400−408. DOI: 10.1007/s12678-017-0445-z.
1.1.
2018
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2018). <p>Atomic layer deposition and properties of ZrO<sub>2</sub>/Fe<sub>2</sub>O<sub>3</sub> thin films</p>. Beilstein Journal of Nanotechnology, 9 (14), 119−128. DOI: 10.3762/bjnano.9.14.
5.2.
2018
Kasikov, Aarne; Tarre, Aivar; Marandi, Margus (2018).

Dispersion of ALD Cr2O3 films in UV-Vis region

. In: Robert Brunner (Ed.). Proceedings of 10th solid state surfaces and interfaces (EXTENDED ABSTRACT BOOK). November 19-22, 2018. Smolenice, Slovak Republic (38−39).10th Solid State Surfaces and Interfaces. Bratislava: Comenius University Bratislava.
3.4.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. IEEE EDS Min-Colloquium, CDE 2017, Advanced Materials and Devices: Challenges and Opportunities: 11th Spanish Conference on Electron Devices, 8-11 February 2017, Barcelona, Spain. IEEE Electron Devices Society, R0030.
5.2.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. FMTDK Teaduskonverents 2017. Tartu Ülikool.
5.2.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Tamm, Aile; Rähn, Mihkel; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. International conference ‘Functional materials and Nanotechnologies-2017’, Tartu, 2017. Tartu Ülikool.
5.2.
2017
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Tamm, Aile; Rähn, Mihkel; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2017). Atomic layer deposition of ZrO2:Fe2O3 thin films. Joint EUROCVD 21 - Baltic ALD 15, Linköping, 2017. Linköping University, 129−129.
1.1.
2016
Kodu, Margus; Berholts, Artjom; Kahro, Tauno; Avarmaa, Tea; Kasikov, Aarne; Niilisk, Ahti; Alles, Harry; Jaaniso, Raivo (2016). Highly sensitive NO2 sensors by pulsed laser deposition on graphene. Applied Physics Letters, 109, 113108. DOI: 10.1063/1.4962959.
5.2.
2016
Kasikov, A.; Kahro, T.; Matisen, L.; Alles, H. (2016).

Transferred CVD graphene on SiO2/Si substrate viewed by ellipsometry

. In: Ro'bert Brunner (Ed.). Proceedings of 9th solid state surfaces and interfaces (EXTENDED ABSTRACT BOOK). November 21-24, 2016 Pies't'any, Slovak Republic (46−48).Solid State Surfaces and Interfaces (SSSI 2016), Pies't'any, Slovakkia, 21.-24. november 2016. Bratislava: Comenius University in Bratislava.
1.1.
2015
Ogorodnikov, I.; Omelkov, S.; Pustovarov, V.; Kasikov, A.; Kirm, M. (2015). Optical and luminescence characterization of LiBaAlF6 single crystals. Optical Materials, 39, 52−57.10.1016/j.optmat.2014.10.063.
5.2.
2015
Tamm, Aile; Oja Acik, Ilona; Kasikov, Aarne; Möldre, Kristel; Arroval, Tõnis; Krunks, Malle; Mere, Arvo; Aarik, Jaan (2015).

Surface plasmon Resonance Caused By Gold Nanoparticles Formed On Atomic Layer Deposited TiO2 Films

. In: Baltic ALD 2015. September 25-29, 2015. International Baltic Conference on Atomic Layer Deposition. Program and Abstracts (P30). Balti ALD. Rahvusvaheline aatomkihtsadestamise Balti konverents. Tartu.
1.1.
2014
Tamm, Aile; Kozlova, Jekaterina; Aarik, Lauri; Aidla, Aleks; Lu, Jun; Kiisler, Alma-Asta; Kasikov, Aarne; Ritslaid, Peeter; Mändar, Hugo; Hultman, Lars; Sammelselg, Väino; Kukli, Kaupo; Aarik, Jaan (2014). Atomic layer deposition of ZrO2 for graphene-based multilayer structures: In situ and ex situ characterization of growth process. physica status solidi (a), 211 (2), 397−402. DOI: 10.1002/pssa.201330106.
1.1.
2014
Jaaniso, Raivo; Kahro, Tauno; Kozlova, Jekaterina; Aarik, Jaan; Aarik, Lauri; Alles, Harry; Floren, Aare; Gerst, Alar; Kasikov, Aarne; Niilisk, Ahti; Sammelselg, Väino (2014). Temperature induced inversion of oxygen response in CVD graphene on SiO2. Sensors and Actuators B-Chemical, 190, 1006−1013. DOI: 10.1016/j.snb.2013.09.068.
1.1.
2014
Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Hus'ekova, Kristina; Dobroc'ka, Edmund; Rammula, Raul, Kasikov, Aarne; Han, Jeong Hwan; Lee, Wongkyu, Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J; Frey, Lothar; Fröhlich, Karol; Aarik, Jaan; Hwang, Cheol Seong (2014). Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes. ACS Applied Materials & Interfaces, 6 (4), 2486−2492.10.1021/am4049139.
1.1.
2013
Aarik, Jaan; Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Kasikov, Aarne; Mändar, Hugo; Hudec, Boris; Hus'ekova, Kristina; Fröhlich, Karol (2013). Atomic layer deposition of rutile phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current. Journal of Crystal Growth, 382, 61−66. DOI: 10.1016/j.jcrysgro.2013.08.006.
1.1.
2013
Hudec, Boris; Hus'ekova, Kristina; Rosova, Alica; S'oltys, Jan; Rammula, Raul; Kasikov, Aarne; Uustare, Teet; Mic'us'ik, Matej; Omastova, Maria; Aarik, Jaan; Fröhlich, Karol (2013). Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor. Journal of Physics D Applied Physics, 46 (38), 385304−8. DOI: 10.1088/0022-3727/46/38/385304.
1.1.
2013
Rosental, Arnold; Tarre, Aivar; Gerst, Alar; Kasikov, Aarne; Lu, Jun; Ottosson, Mikael; Uustare, Teet (2013). Epitaxial single and double nanolayers of SnO2 and TiO2 for resistive gas sensors. IEEE Sensors Journal, 13 (5), 1648−1655.10.1109/JSEN.2013.2238227.
1.1.
2013
Kibena, E.; Marandi, M.; Mäeorg, U.; Venarusso, L.; Maia, G.; Matisen, L.; Kasikov, A.; Sammelselg, V.; Tammeveski, K. (2013). Electrochemical modification of gold electrodes with azobenzene derivatives by diazonium reduction. ChemPhysChem, 14 (5), 1043−1054. DOI: 10.1002/cphc.201200934.
3.1.
2013
Fröhlich, Karol; Hudec, Boris; Tapajna, Milan; Hušekova, Kristina; Rosova, Alica; Eliaš, Peter; Aarik, Jaan; Rammula, Raul; Kasikov, Aarne; Arroval, Tõnis; Aarik, Lauri; Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J. (2013). TiO2-based Metal-Insulator-Metal Structures for Future DRAM Storage Capacities. ECS Transactions, 50 (13), 79−87. DOI: 10.1149/05013.0079ecst.
3.1.
2013
Rammula, Raul; Aarik, Lauri; Kasikov, Arne; Kozlova, Jekaterina; Kahro, Tauno; Matisen, Leonard; Niilisk, Ahti; Alles, Harry; Aarik, Jaan (2013). Atomic layer deposition of aluminum oxide films on graphene. IOP Conference Series: Materials Science and Engineering, 49, 012014. DOI: 10.1088/1757-899X/49/1/012014.
5.2.
2013
Kasikov, A., Tarre, A., Möldre, K., Aarik, J. (2013). Ellipsometric characterization of the growth of ALD TiO2 films. In: Robert Brunner (Ed.). Proceedings of 8th solid state surfaces and interfaces (EXTENDED ABSTRACT BOOK) (74−74).Solid State Surfaces and Interfaces SSSI 2013, 25- 28 november 2013, Smolenice, Slovakkia. Bratislava: Comenius University.
5.2.
2013
Tamm, A.; Kahro, T.; Kozlova, J.; Aarik, L.; Kasikov, A.; Mändar, H.; Rammula, R.; Niilisk, A.; Möldre, K.; Tarre, A.; Alles, H.; Kukli, K.; Aarik, J. (2013). Aatomkihtsadestud dielektikute uurimine grafeeni sisaldavas struktuuris. EMRS-2013, SPRING 13 symposium N: Atomic-scale engineering of multifunctional nano-sized materials and films: EMRS-2013, Strasbourg, Prantsusmaa, mai 2013. x, x.
5.2.
2013
Kahro, Tauno; Kasikov, Aarne; Tarre, Aivar; Gerst, ALar; Niilisk, Ahti; Tõnisoo, Arvo; Möldre, Kristel; Kozlova, Jekaterina; Aarik, Jaan; Alles, Harry; Sammelselg, Väino (2013).

Growing of a thin layer of TiO2 dielectric on CVD graphene

. NT13 International Conference on the Science and Applications of Nanotubes, Programs & Abstracts: NT13, Graphene Satellite Symposium (GSS13), Tallinn, June 29, 2013. Ed. Leila Mäkinen, Toma Susi. Aalto University, School of Science: Aalto University Publication Group, p. 288.
5.2.
2013
Kozlova, Jekaterina; Niilisk, Ahti; Kasikov, Aarne; Gerst, Alar; Kahro, Tauno; Alles, Harry; Sammelselg, Väino (2013).

Quality of graphene prepared by CVD method on nickel

. NT13 Fourteenth International Conference on the Science and Application of Nanotubes, Programs & Abstracts: NT13, 4th Graphene Satellite Symposium (GSS13), Tallinn, Estonia, June 29, 2013. Ed. Leila Mäkinen, Toma Susi. Aalto University, Espoo, Finland: Aalto University Publication Group, p. 290.
1.1.
2012
Aarik, Jaan; Hudec, Boris; Hus'ekova, Kristina; Rammula, Raul; Kasikov, Aarne, Arroval, Tõnis; Uustare, Teet; Fröhlich, Karol (2012). Atomic layer deposition of high-permittivity TiO2 dielectrics with low leakage current on RuO2 in TiCl4-based processes. Semiconductor Science and Technology, 27 (7), 074007−(6). DOI: 10.1088/0268-1242/27/7/074007.
1.3.
2012
Kasikov, Aarne (2012). Mõned statistilised kommentaarid. Mari Järvelaid. "Seksuaalsus ja Homo Sapiens." - Akadeemia, 2012, nr 7, lk 1203-1240, nr 8, lk 1426-1458 [Some statistical comments. Mari Järvelaid. "Seksuaalsus ja Homo Sapiens." - Akadeemia, 2012, No 7, pp 1203-1240, No 8, pp 1426-1458. ]. Akadeemia, 24 (12), 2279−2281.
5.2.
2012
Kasikov, Aarne; Aarik, Jaan; Mändar, Hugo (2012). Transmission spectrometry vs. spectral ellipsometry: Bruggeman EMA layer revisited. In: R.Brunner (Ed.). Progress in Applied Surface, Interface and Thin Film Science 2012. SURFINT-SREN III. May 14-18, 2012-04-27 Florence, Italy. EXTENDED ABSTRACT BOOK (45−46).Progress in Applied Surface, Interface and Thin Film Science 2012. SURFINT-SREN III. 14.-18.mai 2012, Firenze, Itaalia. Bratislava: Comenius University.
1.1.
2011
Fröhlich, K.; Hudec, B.; Aarik, J.; Tarre, A.; Machajdik, D.; Kasikov, A.; Hus'ekova, K.; Gaz'i, S'. (2011). Post-deposition processing and oxygen content of TiO2-based capacitors. Microelectronic Engineering, 88 (7), 1525−1528.10.1016/j.mee.2011.03.129.
1.1.
2011
Hudec, Boris; Hus'ekova, Kristina; Tarre, Aivar; Jeong, Hwan Han; Sosa, Han; Rosova, Alica; Lee, Woongkyu; Kasikov, Aarne; Seul, Ji Song; Aarik, Jaan; Cheol, Song Hwang; Fröhlich, Karol (2011). Electric properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes. Microelectronic Engineering, 88 (7), 1514−1516.10.1016/j.mee.2011.03.059.
1.1.
2011
Hudec, B.; Hus'ekova, K.; Dobroc'ka, E.; Aarik, J.; Rammula, R.; Kasikov, A.; Tarre, A.; Vincze, A.; Fröhlich, K. (2011). Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile dielectric layer. Journal of Vacuum Science and Technology B, 29 (1), 01AC09-1−01AC09-7.
1.1.
2011
Erikson, H.; Kasikov, A.; Johans, C.; Kontturi, K.; Tammeveski, K.; Sarapuu, A. (2011). Oxygen reduction on Nafion-coated thin-film palladium electrodes. Journal of Electroanalytical Chemistry, 652, 1−7. DOI: 10.1016/j.jelechem.2010.12.021.
1.2.
2011
Савихин, Федор; Касиков, Аарне; Васильченко, Евгений (2011). Эволюция взгляда на заселение русскими западного берега Чудского озера (Эстония) и на формирование беспоповского старообрядчества в Причудье. Антропологический форум Online, 15, 112−162.
3.1.
2011
Fröhlich, K.; Hudec, B.; Hušeková, K.; Aarik, J.; Tarre, A.; Kasikov, A.; Rammula, R.; Vincze, A. (2011). Low Equivalent Oxide Thickness TiO2 Based Capacitors for DRAM Application. In: J. Elam, S. De Gendt, A. Londergan, S. Bent, O. Van der Straten, A. Delabie, F. Roozeboom (Ed.). ECS Transactions (73−77). . The Electrochemical Society Inc.. (2). DOI: 10.1149/1.3633656.
1.1.
2010
Sarapuu, A.; Kasikov, A.; Wong, N.; Lucas, C.A.; Sedghi, G.; Nichols, R.J.; Tammeveski, K. (2010). Electroreduction of oxygen on gold-supported nanostructured palladium films in acid solutions. Electrochimica Acta, 55 (22), 6768−6774.10.1016/j.electacta.2010.05.092.
2.3.
2010
Kasikov, Aarne (2010). Optical characterization of inhomogeneous thin films. (Doktoritöö, Tartu Ülikool). Tartu: Tartu University Press.
3.1.
2010
Hudec, B.; Hušekova, K.; Aarik, J.; Tarre, A.; Kasikov, A.; Fröhlich, K. (2010). RuO2/TiO2 based MIM capacitors for DRAM application. In: The 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM 2010); Smolenice, Slovakia; 25-27 Oct. 2010 (341−344).. Piscataway, NJ, USA: IEEE.10.1109/ASDAM.2010.5666356.
5.2.
2010
Kasikov, A. (2010). Metal nanoparticles at an early stage of nucleation. In: Robert Brunner (Ed.). 7th solid state surfaces and interfaces. Extended abstaract book (18−19).7th Conference "Solid State Surfaces and Interfaces", Smolenice loss, Slovakkia, 22.-25. november 2010. Bratislava: Comenius University.
1.1.
2009
Kasikov, A.; Gerst, A.; Kikas, A.; Matisen, L.; Saar, A.; Tarre, A.; Rosental, A. (2009). Pt coated Cr2O3 thin films for gas sensors. Central European Journal of Physics, 7 (2), 356−362. DOI: 10.2478/s11534-009-0049-1.
1.1.
2009
Feldbach, E.; Jaaniso, R.; Kodu, M.; Denks, Viktor P.; Kasikov, A.; Liblik, P.; Maaroos, A.; Mändar, H.; Kirm, M. (2009). Luminescence characterization of ultrathin MgO films of high crystallinity prepared by pulsed laser deposition. Journal of Materials Science-Materials in Electronics, 20 (1), S321−S325. DOI: 10.1007/s10854-008-9599-z.
1.2.
2009
Савихин, Ф.; Kasikov, A.; Васильченко, Е. (2009). Динамика изменения численности русского населения в Западном Причудье (Эстония) в XVII-XIX веках и проблема старообрядчества. Studia Slavica Hungarica, 54 (2), 429−445. DOI: 10.1556/Sslav.54.2009.2.8.
3.2.
2009
Васильченко, Е.; Савихин, Ф.; Касиков, А. (2009). Эволюция взгляда на заселение русскими западного берега Чудского озера. Valentina Bannikova. Дни культуры Причудья 2008-2009 (90−100).. Tallinn: "Новое издательство".
1.1.
2008
Sarapuu, A.; Kallip, S.; Kasikov, A.; Matisen, L.; Tammeveski, K. (2008). Electroreduction of oxygen on gold-supported thin Pt films in acid solutions. Journal of Electroanalytical Chemistry, 624, 144−150. DOI: 10.1016/j.jelechem.2008.09.001.
1.1.
2008
Sarapuu, A.; Kasikov, A.; Laaksonen, T.; Kontturi, K.; Tammeveski, K. (2008). Electrochemical reduction of oxygen on thin-film Pt electrodes in acid solutions. Electrochimica Acta, 53 (20), 5873−5880. DOI: 10.1016/j.electacta.2008.04.003.
1.1.
2008
Josepson, R.; Laan, M.; Aarik, J.; Kasikov, A. (2008). Photoinduced field-assisted electron emission from dielectric-coated electrodes into gases. Journal of Physics D Applied Physics, 41, 135209. DOI: 10.1088/0022-3727/41/13/135209.
1.1.
2008
Kasikov, A. (2008). Optical inhomogeneity model for evaporatef Y2O3 obtained from physical thickness measurement. Applied Surface Science, 254 (12), 3677−3680. DOI: 10.1016/j.apsusc.2007.10.071.
3.2.
2008
Савихин, Федор; Касиков, Арне (2008). Русские в Причудье. Кто они? Русские вне России. История пути. (13−18).. Таллин: Русский дом.
5.2.
2008
Kasikov, A.; Gerst, A.; Matisen, L.; Saar, A.; Tarre, A.; Rosental, A. (2008). Sensitizing Cr2O3 thin films for resistive gas sensors by Pt coating. 6th solid state surfaces and interfaces. November 24-27, 2008 Smolenice Castle, Slovak Republic. Extended abstract book.: 6th solid state surfaces and interfaces. Smolenice, Slovakkia, 24.-27. november 2008. Ed. Brunner, R. Bratislava: Comenius University, 26−29.
1.1.
2007
Denks, V.; Aints, M.; Avarmaa, T.; Choi, J.-S.; Feldbach, E.; Jaaniso, R.; Kasikov, A.; Kirm, M.; Kodu, M.; Lee, M.-S.; Maaroos, A.; Matulevich, Y.T.; Mändar, H.; Raud, J. (2007). Investigation of possible replacement of protective magensium oxide layer in plasma display panels by barium ternary oxides. Journal of Physics D Applied Physics, 40 (15), 4503−4507. DOI: 10.1088/0022-3727/40/15/020.
3.1.
2007
Aarik, J.; Kasikov, A.; Niilisk, A. (2007). Spectrophotometric and Raman spectroscopic characterization of ALD grown TiO2 thin films. Proceedings of SPIE, Advanced Optical Materials, Technologies, and Devices, 6596: 5th International Conference on Advanced Optical Materials, Technologies, and Devices; Vilnius; 27-30 August 2006. Ed. Ašmontas; S.; Gradauskas, J. Bellingham, WA: SPIE, 659616-1−659616-6. (Proceedings of SPIE). DOI: 10.1117/12.726492.
3.5.
2007
Savihin, F.; Kasikov, A.; Vasilchenko, J. (2007). Русские Причудья Эстонии в XVI-XVIII веках (по историческим и языковым данным). Toim. Т.Г.Иванова и др. Петрозаводск: Электронная библиотека музея-заповедника "КИЖИ",.
5.2.
2007
Aarik, J.; Aidla, A.; Kasikov, A.; Mändar, H.; Uustare, T.; Lu, J. (2007). Atomic layer deposition of crystalline Al2O3 thin films. Book of Abstracts: E-MRS 2007 Fall Meeting; Warsaw, Poland; 17 -21 September 2007. Warsaw: Pielaszek Research, 86−87.
1.1.
2006
Aarik, J.; Aidla, A.; Kasikov, A.; Mändar, H.; Rammula, R.; Sammelselg, V. (2006). Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2and ZrO2 thin films. Applied Surface Science, 252 (16), 5723−5734.
1.1.
2006
Kasikov, A.; Aarik, J.; Mandar, H.; Moppel, M.; Pars, M.; Uustare, T. (2006). Refractive index gradients in TiO2 thin films grown by atomic layer deposition. Journal of Physics D: Applied Physics, 39 (1), 54−60.
5.2.
2006
Kasikov, A. (2006).    . Extended Abstract Book: SSSI5. 5th solid state surfaces and interfaces; Smolenice Castle, Slovak Republic; November 19-24, 2006. Ed. Brunner, R. Bratislava: Institute of Physics, 53.
5.2.
2006
Kasikov, A.; Aarik, J.; Niilisk, A. (2006). Spectrophotometric and Raman Spectroscopic Characterization of ALD Grown TiO2 Thin Films    . Program and Abstracts: AOMD-5. 5th International Conference "Advanced Optical Materials and Devices": Vilnius, Lithuania; 27-30 August, 2006. Vilnius: Semiconductor Physics Institute, Lithuania, 40−40.
1.1.
2005
Савихин, Ф.; Kasikov, A. (2005). Новый взгляд на формирование русского старообрядчества в Западном Причудье Эстонии : (по историческим и языковым данным). Russian Linguistics, 2, 137−187. DOI: 10.1007/s11185-005-2030-y.
1.1.
2005
Savikhin, FA.; Kasikov, A. (2005). A new look at the formation of old believer communities in the western Prichud'e of Estonia (on the basis of historical and linguistic data). Russian Linguistics, 29 (2), 137−187.
3.1.
2005
Tarre, A.; Rosental, A.; Uustare, T.; Kasikov, A. (2005). SnO2 on Sapphire. In: Rosental, A. (Ed.). Optical Materials and Applications (1−10). . SPIE. (Proceedings of SPIE).
3.1.
2005
Aarik, J.; Kasikov, A.; Kirm, M.; Lange, S.; Uustare, T.; Mändar, H. (2005). Optical properties of crystalline Al2O3 thin films grown by atomic layer deposition. Proceedings og the Society of Photo-Optical Instrumentation Engineers (SPIE): 4th International Conference on Advanced Optical Materials and Devices, Tartu, Estonia, Jul 06-09, 2004. Toim. Rosental, A., 1−10.
5.2.
2005
Kasikov, A. (2005).          . Abstract Book: 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures ICTF 13/ACSIN 8; Stockholm; 19-23 June 2005. Stockholm: Congrex Sweden AB/Informationsbolaget Nyberg Co, 69.
5.2.
2003
Sammelselg, V.; Aarik, J.; Mändar, H.; Kikas, A.; Käämbre, T.; Kasikov, A.; Zakharov, A.; Jurss, K.; Tapper, U.; Kauppinen, E.; Niinistö, L. (2003). Problems of Thin Films Characterization: Examples Based on HfO2 Films. 890: Symposia U1, 8th European Congress on Advanced Materials and Processes (EUROMAT 2003); Lausanne, Switzerland; September 1-5, 2003. Lausanne, 890.
5.2.
2002
Jurss, K.; Sammelselg, V.; Kasikov, A.; Tarre, A.; Aarik, J. (2002). AFM Investigations of ZrO2 Thin Films. Abstract Book: The 4th Nordic-Baltic SPM Workshop; Tartu, Estonia; May 29-31, 2002. Ed. I. Kink. Tartu Ülikooli Füüsika Instituut, 33−34.
5.2.
2002
Kasikov, A. (2002). Interference in a Thin Film - What Can We See? Proceedings of 3rd SSSI: Solid State Surfaces and Interfaces III; Smolenice, Slovak Republic; 19-21 November 2002. Ed. Gmucova, K.; Brunner, R. Bratislava: Comenius University Press, 40.
5.2.
2002
Kasikov, Aarne; Mändar, Hugo; Sammelselg, Väino; Aarik, Jaan (2002). Optical Properties of ZrO2 Thin Films Grown in Chloride-based Atomic Layer Deposition Process. In: Eva Majkova, Stefan Luby (Ed.). Book of Abstracts. ICTF12. 12th International Conference on Thin Films (114).12th International Conference on Thin Films. Bratislava, 15.-20. september 2002. Bratislava: Institute of Physics, Slovak Academy of Sciences in VEDA, Publishing House of SAS.
1.1.
2001
Niilisk, A.; Rosental, A.; Uustare, T.; Kasikov, A.; Tarre, A. (2001). Chloride atomic-layer chemical vapor deposition of TiO2 with a chloride pretreatment of substrates. Journal de Physique IV, 11, 103−107.
3.1.
2000
Kasikov, A. (2000). LaF3 as a high-index material in VUV. Proc. SPIE. Optical Organic and Inorganic Materials, 4415: Vilnius, 16.-19. august 2000. Bellingham, USA: Spie - International Society For Optical Engineering, 110−114.
6.3.
2000
Kasikov, A. (2000). Arvustus. Vikerkaar, 5-6, 172.
1.1.
1999
Rosental, A.; Tarre, A.; Adamson, P.; Gerst, A.; Kasikov, A.; Niilisk, A. (1999). Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection. Applied Surface Science, 142, 204−209.
1.1.
1999
Sammelselg, V.; Aarik, J.; Aidla, A.; Kasikov, A.; Heikinheimo, E.; Peussa, M.; Niinisto, L. (1999). Composition and thickness determination of thin oxide films: comparison of different programs and methods. Journal of Analytical Atomic Spectrometry, 14 (3), 523−527.
1.2.
1998
Männik, J.; Aarik, J.; Sildos, I.; Kasikov, A.; Aidla, A. (1998). Spectroscopic study of thin titanium dioxide films grown by atomic layer deposition. Proceedings of the Estonian Academy of Sciences. Physics. Mathematics, 47, 56−62.
5.2.
1998
Sammelselg, V.; Aarik, J.; Aidla, A.; Kasikov, A.; Heikinheimo, E.; Peussa, M.; Niinistö, L. (1998). Composition and thickness determination of thin oxide films: Comparison of different programmes and methods. Book of Abstracts: 15th International Congress on X-ray Optics and Microanalysis; Antverpen, Belgium; 24-27 August, 1998. , 102.
3.2.
1996
Kasikov, A.; Kuznetsov, A. S. (1996). Aging of evaporated MgF(2) descripted by various number of parameters. Proceedings of the SPIE, 2967, 237−241.
1.1.
1994
Kasikov, A.; Kuznetsov, A.S. (1994). Model of inhomogeneity for an evaporated mgf2 layer on quartz. Journal of Physics D: Applied Physics, 27 (12), 2470−2474.
3.2.
1990
Касиков, Х.; Касиков, А. (1990). Еще раз о Рюрике Новгородском и Рорике Датчанине. Скандинавский сборник (98−109). . Таллинн: Olion.
23.11.2020

Otsi projekti

  • {{item.Name}}
Asutus on projekti finantseerija   Asutus on projekti teostaja  
  • {{searchListItem.Name}}
Kõik   Tavaprojektid   Ülemprojektid   Alamprojektid  
Uus Frascati (2015)
Uus ja vana Frascati (otsing uue järgi väljastab ka seotud vanad)
Kõik
Käimasolevad
Lõppenud
Algus
Hajus
Täpne
Lihtotsing Tühjenda
  • Leitud 15 kirjet
ProgrammLiikNumberNimiProjekti algusProjekti lõppVastutav täitjaAsutusFinantseerijapoolne rahastamine
1.1.5.3.4.2.2.LLTFY17350Energiamuundamiskadude väljaselgitamine ja vähendamine ökonoomsetes päikesepatareides09.03.201709.05.2020Jaan AarikTartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut481 390,00 EUR
1.2.3.4.MLTFY16096RGrafeenil põhinevad murrangulised tehnoloogiad01.04.201631.03.2018Harry AllesTartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut356 650,00 EUR
1.2.3.4.MLTFY18092RGraphene Flagship Core Project 201.04.201831.03.2020Raivo JaanisoTartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut218 000,00 EUR
IUTIUT2-24Kilestruktuurid nanoelektroonika rakendusteks ja funktsionaalseteks pinnakateteks01.01.201331.12.2018Väino SammelselgTartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut2 688 000,00 EUR
TKTK117Kõrgtehnoloogilised materjalid jätkusuutlikuks arenguks01.01.201131.12.2015Enn LustTartu Ülikool; Tallinna Tehnikaülikool, Keemia ja materjalitehnoloogia teaduskond; Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut; Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Keemia Instituut2 870 086,58 EUR
ETFETF6550Mitmefootonilised ergastus- ja ionisatsiooniprotsessid mittegaussilistes laserkiirtes 01.01.200531.12.2008Viktor PeetTartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut; Tartu Ülikool, Loodus- ja tehnoloogiateaduskond38 159,02 EUR
ETFETF9088Mitte-isostruktuursed epitaksiaalsed kiled: kasvatamine ja struktuuri määramine01.01.201231.12.2015Hugo MändarTartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut54 825,60 EUR
ETFETF7845Nanomõõtmelised metall-dielektrik-struktuurid01.01.200931.12.2012Jaan AarikTartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut; Tartu Ülikool, Loodus- ja tehnoloogiateaduskond65 680,38 EUR
SFSF0382149s02Nanostruktuursed materjalid01.01.200231.12.2006Arnold RosentalTartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut792 696,19 EUR
MUUSLOFY10093EPaardunud spinnid grafeenis01.06.201030.09.2013Jaan AarikTartu Ülikool; Tartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut191 699,99 EUR
ETFETF5861Pinna- ja siirdekihtide mõju laia keelutsooniga oksiidikilede aatomkihtkasvule ja omadustele01.01.200431.12.2007Arnold RosentalTartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut102 754,59 EUR
SFSF0180046s07Pinnanähtused tahkisefüüsikas ja -tehnoloogias01.01.200731.12.2012Väino SammelselgTartu Ülikool, Loodus- ja tehnoloogiateaduskond, Tartu Ülikooli Füüsika Instituut1 590 665,57 EUR
PRGPRG753Takistuslülitusnähtused andmetöötluseks loodud tehismaterjalides01.01.202031.12.2024Kaupo KukliTartu Ülikool, Loodus- ja täppisteaduste valdkond, füüsika instituut514 250,00 EUR
MUUSLOFY12189T (2.1.1101.12-0006)Täiustatud materjalitehnoloogia GaAs-põhiste elektroonika seadiste valmistamiseks01.07.201231.12.2014Jaan AarikTartu Ülikool; Tartu Ülikool, Loodus- ja tehnoloogiateaduskond402 467,50 EUR
TKSLTKT16141T (TK141)Uudsed materjalid ja kõrgtehnoloogilised seadmed energia salvestamise ja muundamise süsteemidele (TK141)01.01.201601.03.2023Enn LustTartu Ülikool, Loodus- ja täppisteaduste valdkond3 293 473,70 EUR