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Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon

Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; San Andres, E.; Martil, I.; Conzalez-Diaz, G.; Kukli, K.; Aarik, J. (2005). Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon. Spanish Conference on Electron Devices, Proceedings: The 5th Spanish Conference on Electron Devices, Tarragona, Spain, Feb. 2-4, 2005. Institute of Electrical and Electronic Engineers, New York, 49−52.
publitseeritud konverentsiettekanne
Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; San Andres, E.; Martil, I.; Conzalez-Diaz, G.; Kukli, K.; Aarik, J.
  • Inglise
Spanish Conference on Electron Devices, Proceedings
The 5th Spanish Conference on Electron Devices, Tarragona, Spain, Feb. 2-4, 2005
Institute of Electrical and Electronic Engineers, New York
2005
4952
Ilmunud
3.4. Artiklid/ettekanded, mis on avaldatud valdkonda 3.1. mittekuuluvates konverentsikogumikes
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