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A comparative study of atomic layer deposited advanced high-k dielectrics

Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; Kukli, K.; Aarik, J.; Ritala, M.; Leskela, M. (2005). A comparative study of atomic layer deposited advanced high-k dielectrics. Spanish Conference on Electron Devices, Proceedings: The 5th Spanish Conference of Electron Devices; Tarragona, Spain; February 2-4, 2005. New York: Institute of Electrical and Electronics Engineers, 29−32.
publitseeritud konverentsiettekanne
Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; Kukli, K.; Aarik, J.; Ritala, M.; Leskela, M.
  • Inglise
Spanish Conference on Electron Devices, Proceedings
The 5th Spanish Conference of Electron Devices; Tarragona, Spain; February 2-4, 2005
New York
Institute of Electrical and Electronics Engineers
0780388100
2005
2932
Ilmunud
3.4. Artiklid/ettekanded, mis on avaldatud valdkonda 3.1. mittekuuluvates konverentsikogumikes
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