Mechanical response of nanometer thick self-assembled monolayers on metallic substrates using classical nanoindentation
Costelle, L.; Jalkanen, P.; Räisänen, M.T.; Lind, L.; Nowak, R.; Räisänen, J. (2011). Mechanical response of nanometer thick self-assembled monolayers on metallic substrates using classical nanoindentation. Journal of Applied Physics, 110 (11), 114301-1−114301-4. DOI: 10.1063/1.3663363.
artikkel ajakirjas
Costelle, L.; Jalkanen, P.; Räisänen, M.T.; Lind, L.; Nowak, R.; Räisänen, J.
- Inglise
Journal of Applied Physics
0021-8979
110
11
2011
114301-1–114301-4
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index, Emerging Sources Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
Ei
WOS
Viited terviktekstile
Seotud asutused
Lisainfo
The work has been carried out in Finland at the University of Helsinki (Department of Physics and Department of Chemisty) and Aalto University (Nordic Hysitron Laboratory)