Electrodeposition of Amorphous Cobalt Alloy as Barrier Layer for Microelectronics
Shaaban, A.; Abdel Aal, A. (2009). Electrodeposition of Amorphous Cobalt Alloy as Barrier Layer for Microelectronics. 1st international joint conference on Materials science, Nanotechnology and Biotechnology, MNB 09, Cairo, Egypt 2009..
publitseeritud konverentsiettekanne
Shaaban, A.; Abdel Aal, A.
1st international joint conference on Materials science, Nanotechnology and Biotechnology, MNB 09, Cairo, Egypt 2009.
2009
Ilmunud
5.2. Konverentsiteesid, mis ei kuulu valdkonda 5.1
Teadmata